Influence of the number of layers and crystallization temperature on the photocatalytic activity of Tio2 / In2 o3 thin films

Paskocimas, Carlos AlbertoGarcia, Laurênia Martins PereiraGurgel, G. H. M.Lovisa, Laura XimenaNascimento, Rubens Maribondo doDelmonte, Maurício Roberto BomioMotta, Fabiana Villela da2021-04-192021-04-192017-07-20GARCIA, Lmp; GURGEL, Ghm; LOVISA, Lx; NASCIMENTO, Rm; PASKOCIMAS, Ca; BOMIO, Mrd; MOTTA, Fv. Influence of the Number of Layers and Crystallization Temperature on the Photocatalytic Activity of Tio2 / In2O3 Thin Films. Material Science & Engineering International Journal, [S.L.], v. 1, n. 1, p. 5-11, 20 jul. 2017. Disponível em: https://medcraveonline.com/MSEIJ/influence-of-the-number-of-layers-and-crystallization-temperature-on-the-photocatalytic-activity-of-tio2--in2o3-thin-films.html. Acesso em: 14 dez. 2020. http://dx.doi.org/10.15406/mseij.2017.01.00005.2574-9927https://repositorio.ufrn.br/handle/123456789/32272Attribution-NonCommercial 3.0 Brazilhttp://creativecommons.org/licenses/by-nc/3.0/br/LayersCrystallization TemperaturePhotocatalytic ActivityTio2 / In2O3Thin FilmsInfluence of the number of layers and crystallization temperature on the photocatalytic activity of Tio2 / In2 o3 thin filmsarticle10.15406/mseij.2017.01.00005