A novel technology to deposition diamond-like carbon thin films: cathodic cylinder plasma deposition

Araújo, Anthunes Íkaro deNascimento, Igor OliveiraFeitor, Michelle CequeiraLibório, Maxwell SantanaLinhares, Álvaro Albueno da SilvaVieira, Pâmela SamaraAlves, Salete MartinsSousa, Rômulo Ribeiro Magalhães deLima, Cleânio da LuzSousa, Ediones Maciel deCosta, Thercio Henrique de Carvalho2025-11-012025-11-012025ARAÚJO, Anthunes Íkaro de; NASCIMENTO, Igor Oliveira; FEITOR, Michelle Cequeira; LIBÓRIO, Maxwell Santana; LINHARES, Álvaro Albueno da Silva; VIEIRA, Pâmala Samara; ALVES, Salete Martins; SOUSA, Rômulo Ribeiro Magalhães de; LIMA, Cleânio da Luz; SOUSA, Ediones Maciel de. A novel technology to deposition diamond-like carbon thin films: cathodic cylinder plasma deposition. Jom, [S.L.], v. 77, n. 9, p. 6387-6399, 16 jul. 2025. Springer Science and Business Media LLC. http://dx.doi.org/10.1007/s11837-025-07572-z. Disponível em: https://link.springer.com/article/10.1007/s11837-025-07572-z. Acesso em: 09 out. 2025.https://repositorio.ufrn.br/handle/123456789/65980enDeposition temperatureDiamond-Like Carbon (DLC) filmsCathodic Cylinder Plasma Deposition (CCyPD)HardnessTribological propertiesA novel technology to deposition diamond-like carbon thin films: cathodic cylinder plasma depositionarticlehttps://doi.org/10.1007/s11837-025-07572-z.