Thin tin and tio2 film deposition in glass samples by cathodic cage

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dc.contributor.authorFeitor, Michelle Cequeira
dc.contributor.authorSousa, Rômulo Ribeiro Magalhães de
dc.contributor.authorAraújo, Francisco Odolberto de
dc.contributor.authorCosta, Thercio Henrique de Carvalho
dc.contributor.authorNascimento, Igor Oliveira
dc.contributor.authorSantos, Francisco Eroni Paes
dc.contributor.authorAlves Júnior, Clodomiro
dc.date.accessioned2022-02-22T18:50:42Z
dc.date.available2022-02-22T18:50:42Z
dc.date.issued2015-04
dc.description.resumoThin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 μm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperaturespt_BR
dc.identifier.citationSOUSA, Rômulo Ribeiro Magalhães de; ARAÚJO, Francisco Odolberto de; COSTA, Thercio Henrique de Carvalho; NASCIMENTO, Igor Oliveira; SANTOS, Francisco Eroni Paes; ALVES JÚNIOR, Clodomiro; FEITOR, Michelle Cequeira. Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage. Materials Research, [S.l.], v. 18, n. 2, p. 347-352, abr. 2015. FapUNIFESP (SciELO). DOI: http://dx.doi.org/10.1590/1516-1439.313914. Disponível em: https://www.scielo.br/j/mr/a/fQcT6HCFsLqnhpNMsdzgnFz/?lang=en. Acesso em: 14 abr. 2021.pt_BR
dc.identifier.doihttp://dx.doi.org/10.1590/1516-1439.313914
dc.identifier.issnPrint: 1516-1439 Electronic: 1980-5373 ABM, ABC, ABPol"
dc.identifier.urihttps://repositorio.ufrn.br/handle/123456789/46187
dc.languageenpt_BR
dc.publisherMaterials Researchpt_BR
dc.rightsAtribuição-NãoComercial 3.0 Brasil*
dc.rights.urihttps://creativecommons.org/licenses/by-nc/3.0/br/*
dc.subjecttitanium nitridept_BR
dc.subjectcathodic cagept_BR
dc.subjecttitanium dioxidept_BR
dc.subjectthin films and hollow cathodept_BR
dc.titleThin tin and tio2 film deposition in glass samples by cathodic cagept_BR
dc.typearticlept_BR

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