Surface modification of Ti implants by plasma oxidation in hollow cathode discharge

dc.contributor.authorSilva, M. A. M.
dc.contributor.authorMartinelli, Antonio Eduardo
dc.contributor.authorAlves Júnior, Clodomiro
dc.contributor.authorNascimento, Rubens Maribondo do
dc.contributor.authorTávora, Michele Portela
dc.contributor.authorVilar, Carlos da Silva
dc.date.accessioned2021-01-20T21:07:38Z
dc.date.available2021-01-20T21:07:38Z
dc.date.issued2006-01-24
dc.description.resumoAs a result of superior biocompatibility and mechanical adequacy, titanium has been widely used in the manufacture of dental implants. On the downside, relatively long periods are normally required to fully integration of the bone into the implant. Surface modification techniques have the potential to shorten the osseointegration time of implants significantly contributing to patient comfort. In this work, plasma discharge in oxidizing atmospheres was used to modify the surface of Ti implants by the production of rough surfaces that consists of a mixture of Ti-oxides. The results showed that considerable improvement on surface roughness and mechanical stability of the oxidized layers could be achieved by confining the effect of the plasma discharge by shielding the cathodic region of the reactor. Processing parameters including temperature, time and pressure were optimized and applied to commercially available Ti implants. Improved wetting was obtained, which is potentially associated to shorter osseointegration periodspt_BR
dc.identifier.citationSILVA, M.A.M.; MARTINELLI, A.e.; ALVES, C.; NASCIMENTO, R.M.; TÁVORA, M.P.; VILAR, C.D.. Surface modification of Ti implants by plasma oxidation in hollow cathode discharge. Surface And Coatings Technology, [S.L.], v. 200, n. 8, p. 2618-2626, jan. 2006. Disponível em: http://ftp.demec.ufpr.br/disciplinas/EME715/AT%20PGMEC/Artigos%20para%20Semin%C3%A1rio/Aquivos%20implantes/Molhabilidade.pdf. Acesso em: 24 nov. 2020. http://dx.doi.org/10.1016/j.surfcoat.2004.12.027.pt_BR
dc.identifier.doi10.1016/j.surfcoat.2004.12.027
dc.identifier.issn0257-8972
dc.identifier.urihttps://repositorio.ufrn.br/handle/123456789/31299
dc.languageenpt_BR
dc.publisherElsevierpt_BR
dc.rightsAttribution 3.0 Brazil*
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/br/*
dc.subjectPlasmapt_BR
dc.subjectSurface modificationpt_BR
dc.subjectTitaniumpt_BR
dc.subjectTitanium oxidept_BR
dc.subjectRoughnesspt_BR
dc.titleSurface modification of Ti implants by plasma oxidation in hollow cathode dischargept_BR
dc.typearticlept_BR

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