Please use this identifier to cite or link to this item: https://repositorio.ufrn.br/handle/123456789/45566
Title: Optical-electrical properties and thickness analysis of TiO2 thin films obtained by magnetron sputtering
Authors: Feitor, Michelle Cerqueira
S. Sobrinho, V. S.
Miranda Neto, José Queiroz de
Lima, L. L. F.
Souza, Iedo A
Libório, Maxwell Santana
Queiroz, José César Augusto de
Sousa, Rômulo Ribeiro Magalhães de
Almeida, Érika Oliveira de
Costa, Thércio Henrique de Carvalho
Keywords: Thin films;Magnetron sputtering;Swanepoel method;PUMA;Transmittance
Issue Date: 23-Sep-2020
Publisher: Springer Science and Business Media LLC
Citation: S. SOBRINHO, V. S.; M. NETO, J.Q.; LIMA, L.L.F.; SOUZA, I.A.; LIBÓRIO, M.S.; QUEIROZ, J.C.A.; SOUSA, R.R.M.; ALMEIDA, E.O.; FEITOR, M.C.; COSTA, T.H.C.. Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering. Brazilian Journal of Physics, [S.l.], v. 50, n. 6, p. 771-779, 23 set. 2020. Disponível em: https://link.springer.com/article/10.1007%2Fs13538-020-00794-3. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s13538-020-00794-3.
Portuguese Abstract: The study of thin films with properties that meet specific needs and improve people’s quality of life has been the focus of many researchers. However, knowing and controlling the production techniques of these films have been a challenge for the industry of optical-electronic devices, functional coatings, and energy conservation. The thickness of thin films is a parameter that influences the optical and electrical characteristics of these materials, thus being one of the most important information in the plasma deposition process. Because of the need for precision in measuring the thickness of thin transparent films, this work proposes to evaluate the Swanepoel methods (envelope) and the PUMA, computational method, from optical transmittance curves and compare them with the measurements directly made by microscopy. Scanning electronics for thin films of TiO2 deposited by magnetron sputtering in different conditions. The results of this study showed that the PUMA method is capable of calculating film thicknesses of a few hundred nanometers and with few interference fringes. The PUMA method showed convergence with high precision for films produced with 30 and 60 min of treatment and a difference of 17% for films with 120 min of deposition concerning the measurements made by microscopy
URI: https://repositorio.ufrn.br/handle/123456789/45566
ISSN: 0103-9733
1678-4448
Embargoed until: 2030-12
Appears in Collections:CT - DEM - Artigos publicados em periódicos
CT - DET - Artigos publicados em periódicos
EAJ - Artigos publicados em periódicos

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