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Título: | Optical-electrical properties and thickness analysis of TiO2 thin films obtained by magnetron sputtering |
Autor(es): | Feitor, Michelle Cerqueira S. Sobrinho, V. S. Miranda Neto, José Queiroz de Lima, L. L. F. Souza, Iedo A Libório, Maxwell Santana Queiroz, José César Augusto de Sousa, Rômulo Ribeiro Magalhães de Almeida, Érika Oliveira de Costa, Thércio Henrique de Carvalho |
Palavras-chave: | Thin films;Magnetron sputtering;Swanepoel method;PUMA;Transmittance |
Data do documento: | 23-Set-2020 |
Editor: | Springer Science and Business Media LLC |
Referência: | S. SOBRINHO, V. S.; M. NETO, J.Q.; LIMA, L.L.F.; SOUZA, I.A.; LIBÓRIO, M.S.; QUEIROZ, J.C.A.; SOUSA, R.R.M.; ALMEIDA, E.O.; FEITOR, M.C.; COSTA, T.H.C.. Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering. Brazilian Journal of Physics, [S.l.], v. 50, n. 6, p. 771-779, 23 set. 2020. Disponível em: https://link.springer.com/article/10.1007%2Fs13538-020-00794-3. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s13538-020-00794-3. |
Resumo: | The study of thin films with properties that meet specific needs and improve people’s quality of life has been the focus of many researchers. However, knowing and controlling the production techniques of these films have been a challenge for the industry of optical-electronic devices, functional coatings, and energy conservation. The thickness of thin films is a parameter that influences the optical and electrical characteristics of these materials, thus being one of the most important information in the plasma deposition process. Because of the need for precision in measuring the thickness of thin transparent films, this work proposes to evaluate the Swanepoel methods (envelope) and the PUMA, computational method, from optical transmittance curves and compare them with the measurements directly made by microscopy. Scanning electronics for thin films of TiO2 deposited by magnetron sputtering in different conditions. The results of this study showed that the PUMA method is capable of calculating film thicknesses of a few hundred nanometers and with few interference fringes. The PUMA method showed convergence with high precision for films produced with 30 and 60 min of treatment and a difference of 17% for films with 120 min of deposition concerning the measurements made by microscopy |
URI: | https://repositorio.ufrn.br/handle/123456789/45566 |
ISSN: | 0103-9733 1678-4448 |
Embargado até: | 2030-12 |
Aparece nas coleções: | CT - DEM - Artigos publicados em periódicos CT - DET - Artigos publicados em periódicos EAJ - Artigos publicados em periódicos |
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Arquivo | Descrição | Tamanho | Formato | |
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Optical-ElectricalProperties_FEITOR_2020.pdf Acesso restrito até 2030-11-30 | 1,62 MB | Adobe PDF | Visualizar/Abrir |
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